ALEXANDRIA, Va., June 4 -- United States Patent no. 12,324,164, issued on June 3, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).
"Alignment mark for MRAM device and method" was invented by Wei-De Ho (Hsinchu, Taiwan), Lan-Hsin Chiang (Hsinchu, Taiwan), Chien-Hua Huang (Toufen Township, Miaoli County, Taiwan), Chung-Te Lin (Tainan, Taiwan), Yung-Yu Wang (Hsinchu, Taiwan), Sheng-Yuan Chang (Hsinchu, Taiwan) and Kai-Chieh Liang (Taipei, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "Structures and formation methods of a semiconductor structure are provided. The semiconductor structure includes an insulating layer covering a device region and an alignment mark region of...