US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on June 24 for "Tunable plasma exclusion zone in semiconductor fabrication" (Taiwanese Inventors)

ALEXANDRIA, Va., June 25 -- United States Patent no. 12,340,987, issued on June 24, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY Ltd. (Hsin-Chu, Taiwan).

"Tunable plasma exclusion zone in semiconductor fabrication" was invented by Che Wei Yang (New Taipei, Taiwan), Chih Cheng Shih (Kaohsiung, Taiwan), Sheng-Chan Li (Tainan, Taiwan), Cheng-Yuan Tsai (Chu-Pei, Taiwan) and Sheng-Chau Chen (Tainan, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A tunable plasma exclusion zone in semiconductor fabrication is provided. A semiconductor wafer is provided within a chamber of a plasma processing apparatus between a first plasma electrode and a second plasma electrode. A plasma is generated from a ...