US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on June 24 for "Photomask and method for manufacturing photomask and semiconductor structure thereof" (Taiwanese Inventors)

ALEXANDRIA, Va., June 25 -- United States Patent no. 12,340,163, issued on June 24, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).

"Photomask and method for manufacturing photomask and semiconductor structure thereof" was invented by Chin-Min Huang (Taichung, Taiwan), Ching-Hung Lai (Taipei, Taiwan), Jia-Guei Jou (New Taipei, Taiwan), Yin-Chuan Chen (Taichung, Taiwan) and Chi-Ming Tsai (Taipei, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for forming a photomask includes following operations. A first photomask is received. The first photomask includes a first pattern and a first scattering bar. The first photomask is used to remove a first portion of a ta...