US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on June 24 for "Mandrel fin design for double seal ring" (Taiwanese Inventors)

ALEXANDRIA, Va., June 25 -- United States Patent no. 12,341,113, issued on June 24, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).

"Mandrel fin design for double seal ring" was invented by Shan-Yu Huang (Hsinchu County, Taiwan), Hsueh-Heng Lin (Hsinchu, Taiwan), Shih-Chang Chen (Hsinchu, Taiwan), Hsiao-Wen Chung (Taipei, Taiwan) and Yilun Chen (Hsinchu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor structure includes two circuit regions and two inner seal rings, each of which surrounds one of the circuit regions. Each inner seal ring has a substantially rectangular periphery with four interior corner stress relief (CSR) structures. The semiconductor...