US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on June 24 for "Dummy patterns in redundant region of double seal ring" (Taiwanese Inventors)

ALEXANDRIA, Va., June 25 -- United States Patent no. 12,341,071, issued on June 24, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).

"Dummy patterns in redundant region of double seal ring" was invented by Shan-Yu Huang (Zhubei, Taiwan), Hsiao-Wen Chung (Taipei, Taiwan), Yi-Lun Chen (Hsinchu, Taiwan) and Huang-Sheng Lin (Hsin-Chu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor structure includes first and second inner seal rings each having a first section and a second section substantially perpendicular to the first section. The semiconductor structure further includes an outer seal ring. The outer seal ring has a third section, and a fourth section, ...