ALEXANDRIA, Va., June 19 -- United States Patent no. 12,336,258, issued on June 17, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).
"Semiconductor structure" was invented by Yen-Ching Wu (Taoyuan, Taiwan), Chung-Kai Lin (Taipei, Taiwan), Kuan-Lun Cheng (Hsin-Chu, Taiwan), Wen-Chien Lin (Taoyuan, Taiwan) and Chih-Ling Hsiao (Tainan, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor structure includes an insulator, a semiconductor fin, a gate stack, a gate contact, a source/drain material, and a source/drain contact structure. The semiconductor fin protrudes from the insulator. The gate stack is disposed on the semiconductor fin and the insulator. The gate con...