ALEXANDRIA, Va., June 19 -- United States Patent no. 12,336,271, issued on June 17, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).

"Semiconductor devices and methods of manufacturing thereof" was invented by Shih-Yao Lin (New Taipei, Taiwan), Chen-Ping Chen (Toucheng Township, Taiwan), Chen-Yui Yang (Hsinchu, Taiwan), Hsiao Wen Lee (Hsinchu, Taiwan) and Ming-Ching Chang (Hsinchu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor device includes a first plurality of channel layers. The first plurality of channel layers extend along a first direction. The semiconductor device includes a second plurality of channel layers. The second plurality of channel layer...