US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on June 17 for "Pattern fidelity enhancement" (Taiwanese Inventors)

ALEXANDRIA, Va., June 19 -- United States Patent no. 12,334,342, issued on June 17, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING Co. LTD. (Hsinchu, Taiwan).

"Pattern fidelity enhancement" was invented by Yu-Tien Shen (Tainan, Taiwan), Ya-Wen Yeh (Taipei, Taiwan), Wei-Liang Lin (Hsin-Chu, Taiwan), Ya Hui Chang (Hsinchu, Taiwan), Yung-Sung Yen (New Taipei, Taiwan), Wei-Hao Wu (Hsinchu, Taiwan), Li-Te Lin (Hsinchu, Taiwan), Ru-Gun Liu (Hsinchu County, Taiwan) and Kuei-Shun Chen (Hsinchu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure provides a method for semiconductor manufacturing in accordance with some embodiments. The method includes forming a hard mask layer over a subs...