ALEXANDRIA, Va., June 19 -- United States Patent no. 12,336,295, issued on June 17, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).
"Integrated circuit device and method" was invented by Wei-Ren Chen (Hsinchu, Taiwan), Cheng-Yu Lin (Hsinchu, Taiwan), Hui-Zhong Zhuang (Hsinchu, Taiwan), Yung-Chen Chien (Hsinchu, Taiwan), Jerry Chang Jui Kao (Hsinchu, Taiwan), Huang-Yu Chen (Hsinchu, Taiwan) and Chung-Hsing Wang (Hsinchu, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "An integrated circuit (IC) device includes a substrate, at least one active region over the substrate and elongated along a first axis, at least one gate region extending across the at least one active re...