ALEXANDRIA, Va., June 19 -- United States Patent no. 12,336,214, issued on June 17, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING Co. LTD. (Hsinchu, Taiwan).

"Inner spacers for gate-all-around semiconductor devices" was invented by Yu-Yun Peng (Hsinchu, Taiwan), Fu-Ting Yen (Hsinchu, Taiwan), Ting-Ting Chen (New Taipei, Taiwan), Keng-Chu Lin (Ping-Tung, Taiwan) and Tsu-Hsiu Perng (Zhubei, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "Semiconductor devices and methods of forming the same are provided. A semiconductor device according to the present disclosure includes a first semiconductor channel member and a second semiconductor channel member over the first semiconductor channel member and a p...