ALEXANDRIA, Va., June 18 -- United States Patent no. 12,326,397, issued on June 10, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).

"In-situ apparatus for detecting abnormality in process tube" was invented by Yu-Jen Yang (Hsinchu, Taiwan), Chung-Pin Chou (Hsinchu, Taiwan), Kai-Lin Chuang (Hsinchu, Taiwan), Yan-Cheng Chen (Hsinchu, Taiwan), Sheng-Ching Kao (Hsinchu, Taiwan) and Jun-Xiu Liu (Hsinchu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A process tube device can detect the presence of any external materials that may reside within a fluid flowing in the tube. The process tube device detects the external materials in-situ which obviates the need for a separate ins...