US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on June 10 for "Deflector for chamber cleaning" (Taiwanese Inventors)

ALEXANDRIA, Va., June 18 -- United States Patent no. 12,325,913, issued on June 10, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).

"Deflector for chamber cleaning" was invented by Kuang-Wei Cheng (Hsinchu, Taiwan), Sung-Ju Huang (Taipei, Taiwan), Yung-Tsun Liu (Taipei, Taiwan), Chih-Tsung Lee (Hsinchu, Taiwan) and Chyi-Tsong Ni (Hsinchu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of fabricating semiconductor devices includes: loading one or more semiconductor wafers into a plurality of stations provided within a process chamber; applying a process to the semiconductor wafers which deposits a material on the one or more semiconductor wafers within the pr...