US Patent Issued to Taiwan Semiconductor Manufacturing on July 8 for "System and method for residual gas analysis" (Taiwanese Inventor)

ALEXANDRIA, Va., July 9 -- United States Patent no. 12,354,857, issued on July 8, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).

"System and method for residual gas analysis" was invented by Yen-Liang Chen (Hsinchu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure provides embodiments of a system and method for detecting processing chamber condition. The embodiments include performing a wafer-less processing step in a processing chamber to determine the condition of the chamber walls. Based on an analysis of the residual gas resulting from the wafer-less processing step, an operator or a process controller can determine whether the chamber walls hav...