US Patent Issued to Taiwan Semiconductor Manufacturing on July 8 for "System and method for multiple step directional patterning" (Taiwanese Inventors)

ALEXANDRIA, Va., July 9 -- United States Patent no. 12,354,873, issued on July 8, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).

"System and method for multiple step directional patterning" was invented by Chih-Kai Yang (Hsinchu, Taiwan), Yu-Tien Shen (Hsinchu, Taiwan), Hsiang-Ming Chang (Hsinchu, Taiwan), Chun-Yen Chang (Hsinchu, Taiwan), Ya-Hui Chang (Hsinchu, Taiwan), Wei-Ting Chien (Hsinchu, Taiwan), Chia-Cheng Chen (Hsinchu, Taiwan) and Liang-Yin Chen (Hsinchu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor process system includes an ion source configured to bombard with a photoresist structure on a wafer. The semiconductor process system reduces a ...