US Patent Issued to Taiwan Semiconductor Manufacturing on July 8 for "Photoresist system and method" (Taiwanese Inventors)

ALEXANDRIA, Va., July 9 -- United States Patent no. 12,353,134, issued on July 8, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).

"Photoresist system and method" was invented by Hung-Jui Kuo (Hsinchu, Taiwan), De-Yuan Lu (Taipei, Taiwan), Chen-Hua Yu (Hsinchu, Taiwan) and Ming-Tan Lee (Kaohsiung, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A photoresist apparatus and a method are provided. The photoresist apparatus includes a pre-baking apparatus. The pre-baking apparatus includes: a hot-plate, a first cover over the hot-plate, a second cover over the first cover, a first heating element extending along a topmost surface of the first cover, and a second heating elemen...