ALEXANDRIA, Va., July 9 -- United States Patent no. 12,354,867, issued on July 8, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).
"Particle removal apparatus" was invented by Siao-Chian Huang (Hsinchu, Taiwan), Po-Chung Cheng (Zhongpu Shiang, Taiwan), Ching-Juinn Huang (Changhua, Taiwan), Tzung-Chi Fu (Miaoli, Taiwan) and Tsung-Yen Lee (Jhudong Township, Hsinchu County, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A particle removal apparatus is provided. The apparatus includes a reticle holder configured to hold a reticle, a robotic arm, and a particle removal device disposed on the robotic arm. The particle removal device includes a solution spraying module, a su...