US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on July 8 for "EUV photo masks and manufacturing method thereof" (Taiwanese Inventors)

ALEXANDRIA, Va., July 9 -- United States Patent no. 12,353,120, issued on July 8, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).

"EUV photo masks and manufacturing method thereof" was invented by Wei-Che Hsieh (Taipei, Taiwan), Chi-Lun Lu (Hsinchu, Taiwan), Ping-Hsun Lin (New Taipei, Taiwan), Fu-Sheng Chu (Zhubei, Taiwan), Ta-Cheng Lien (Cyonglin Township, Taiwan) and Hsin-Chang Lee (Zhubei, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A reflective mask includes a substrate, a lower reflective multilayer disposed over the substrate, an intermediate layer disposed over the lower reflective multilayer, an upper reflective multilayer disposed over the intermediate la...