US Patent Issued to Taiwan Semiconductor Manufacturing on July 29 for "Vacuum systems in semiconductor fabrication facilities" (Taiwanese Inventors)

ALEXANDRIA, Va., July 30 -- United States Patent no. 12,371,780, issued on July 29, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).

"Vacuum systems in semiconductor fabrication facilities" was invented by Ming-Fa Wu (Kaohsiung, Taiwan), Wen-Lung Ho (Baoshan Township, Taiwan) and Huai-Tei Yang (Hsinchu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "Methods and devices are provided wherein rotational gas-flow is generated by vortex generators to decontaminate dirty gas (e.g., gas contaminated by solid particles) in pumping lines of vacuum systems suitable for use at a semiconductor integrated circuit fabrication facility. The vacuum systems use filterless particle deconta...