US Patent Issued to Taiwan Semiconductor Manufacturing on July 29 for "Semiconductor processing apparatus for generating plasma" (Taiwanese Inventors)

ALEXANDRIA, Va., July 30 -- United States Patent no. 12,374,530, issued on July 29, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).

"Semiconductor processing apparatus for generating plasma" was invented by Chien-Hsiang Chen (Hsinchu, Taiwan), Ching-Horng Chen (Hsinchu County, Taiwan), Yen-Ji Chen (Hsinchu, Taiwan), Cheng-Yi Huang (Hsinchu, Taiwan) and Chih-Shen Yang (Yunlin County, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A Faraday shield, a semiconductor processing apparatus, and an etching apparatus are provided. The Faraday shield includes a plurality of conductive slices and a spacer interposed between adjacent two of the conductive slices to electrically isol...