ALEXANDRIA, Va., July 30 -- United States Patent no. 12,374,525, issued on July 29, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).

"Plasma processing tool and operating method thereof" was invented by Yung Chang Huang (Taichung, Taiwan), Chia Jung Hsu (Tainan, Taiwan) and Yu Hsiu Chen (Tainan, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "The method includes placing a wafer in a chamber body of a plasma processing tool; moving a first movable jig along an arc path to comb a spiral-shaped radio frequency (RF) coil over the chamber body, the first movable jig having a plurality of first confining slots penetrated by a plurality of coil segments of the spiral-shaped R...