US Patent Issued to Taiwan Semiconductor Manufacturing on July 29 for "Methods of cleaning a lithography system" (Taiwanese Inventors)

ALEXANDRIA, Va., July 30 -- United States Patent no. 12,372,887, issued on July 29, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).

"Methods of cleaning a lithography system" was invented by Cho-Ying Lin (Hsinchu, Taiwan), Tai-Yu Chen (Hsinchu, Taiwan), Chieh Hsieh (Hsinchu, Taiwan), Sheng-Kang Yu (Hsinchu, Taiwan), Shang-Chieh Chien (Hsinchu, Taiwan), Li-Jui Chen (Hsinchu, Taiwan) and Heng-Hsin Liu (Hsinchu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method includes: removing debris on a collector of a lithography equipment by changing physical structure of the debris with a cleaner; forming a cleaned collector by exhausting the removable debris from the collector...