US Patent Issued to Taiwan Semiconductor Manufacturing on July 29 for "Lens adjustment for an edge exposure tool" (Taiwanese Inventors)

ALEXANDRIA, Va., July 30 -- United States Patent no. 12,372,876, issued on July 29, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).

"Lens adjustment for an edge exposure tool" was invented by Yong-Ting Wu (Tainan, Taiwan) and Yu Kai Chen (Tainan, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "An edge exposure tool may include a lens adjustment device that is capable of automatically adjusting various parameters of an edge exposure lens to account for changes in operating parameters of the edge exposure tool. In some implementations, the edge exposure tool may also include a controller that is capable of determining edge adjustment parameters for the edge exposure lens an...