US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on July 29 for "Inspection system for extreme ultraviolet (EUV) light source" (Taiwanese Inventors)

ALEXANDRIA, Va., July 30 -- United States Patent no. 12,372,878, issued on July 29, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).

"Inspection system for extreme ultraviolet (EUV) light source" was invented by Chiao-Hua Cheng (Tainan, Taiwan), Sheng-Kang Yu (Hsinchu, Taiwan), Heng-Hsin Liu (New Taipei, Taiwan), Li-Jui Chen (Hsinchu, Taiwan) and Shang-Chieh Chien (New Taipei, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for inspecting an extreme ultraviolet (EUV) light source includes: removing a collector mirror of the EUV light source from a collector chamber; installing an inspection apparatus within the collector chamber, the apparatus including a sele...