ALEXANDRIA, Va., July 30 -- United States Patent no. 12,374,522, issued on July 29, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).
"Detection systems in semiconductor metrology tools" was invented by Shih-Wei Hung (Kaohsiung, Taiwan) and Jang Jung Lee (Hsinchu, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor metrology tool for analyzing a sample is disclosed. The semiconductor metrology tool includes a particle generation system, a local electrode, a particle capture device, a position detector, and a processor. The particle generation system is configured to remove a particle from a sample. The local electrode is configured to produce an attractive elect...