ALEXANDRIA, Va., July 23 -- United States Patent no. 12,369,377, issued on July 22, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).

"Semiconductor structure and forming method thereof" was invented by Jhu-Min Song (Nantou County, Taiwan), Chien-Chih Chou (New Taipei, Taiwan) and Yu-Chang Jong (Hsinchu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor structure and forming method thereof are provided. A substrate includes a region. A first gate structure and a sacrificial gate structure are recessed in the substrate and disposed in the region. The sacrificial gate structure is adjacent to the first gate structure. A first contact is electrically connecte...