ALEXANDRIA, Va., July 23 -- United States Patent no. 12,368,018, issued on July 22, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).
"Method for ion implantation uniformity control" was invented by Tien-Shun Chang (New Taipei, Taiwan), Yu-Kang Liu (Taipei, Taiwan), Su-Hao Liu (Jhongpu Township, Taiwan), Huicheng Chang (Tainan, Taiwan) and Yee-Chia Yeo (Hsinchu, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method includes moving a plurality of sensors along a translation path with respect to an ion beam, acquiring sensor signals produced by the plurality of sensors, converting the acquired sensor signals into a data set representative of a two-dimensional (2D) profile ...