ALEXANDRIA, Va., July 23 -- United States Patent no. 12,369,413, issued on July 22, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).
"Method for forming an image sensor" was invented by Po-Chun Liu (Hsinchu, Taiwan), Yung-Chang Chang (Taipei, Taiwan) and Eugene I-Chun Chen (Taipei, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "Various embodiments of the present disclosure are directed towards a method for forming an image sensor in which a device layer has high crystalline quality. According to some embodiments, a hard mask layer is deposited covering a substrate. A first etch is performed into the hard mask layer and the substrate to form a cavity. A second etch is perf...