US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on July 22 for "EUV photo masks and manufacturing method thereof" (Taiwanese Inventors)

ALEXANDRIA, Va., July 23 -- United States Patent no. 12,366,797, issued on July 22, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).

"EUV photo masks and manufacturing method thereof" was invented by Hung-Yi Tsai (Zhubei, Taiwan), Wei-Che Hsieh (Taipei, Taiwan), Ta-Cheng Lien (Cyonglin Township, Taiwan), Hsin-Chang Lee (Zhubei, Taiwan), Ping-Hsun Lin (New Taipei, Taiwan), Hao-Ping Cheng (Hsinchu, Taiwan), Ming-Wei Chen (Hsinchu, Taiwan) and Szu-Ping Tsai (Hsinchu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A reflective mask includes a substrate, a reflective multilayer disposed on the substrate, a capping layer disposed on the reflective multilayer, and an absorbe...