US Patent Issued to Taiwan Semiconductor Manufacturing on July 22 for "Convergent fin and nanostructure transistor structure and method" (Taiwanese Inventors)

ALEXANDRIA, Va., July 23 -- United States Patent no. 12,369,366, issued on July 22, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).

"Convergent fin and nanostructure transistor structure and method" was invented by Kuan-Ting Pan (Hsinchu, Taiwan), Kuo-Cheng Chiang (Hsinchu, Taiwan), Shi Ning Ju (Hsinchu, Taiwan), Yi-Ruei Jhan (Hsinchu, Taiwan), Yen-Ming Chen (Hsinchu, Taiwan) and Chih-Hao Wang (Hsinchu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A device includes a substrate, a first semiconductor fin over the substrate extending in a first lateral direction, a first vertical stack of semiconductor nanosheets over the substrate extending in the first lateral directio...