US Patent Issued to Taiwan Semiconductor Manufacturing on July 15 for "System and method for measuring magnetic fields in PVD system" (Taiwanese Inventors)

ALEXANDRIA, Va., July 16 -- United States Patent no. 12,360,179, issued on July 15, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).

"System and method for measuring magnetic fields in PVD system" was invented by Wen-Hao Cheng (Hsinchu, Taiwan), Hsuan-Chih Chu (Hsinchu, Taiwan) and Yen-Yu Chen (Hsinchu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A thin-film deposition system includes a thin-film deposition chamber. A magnetron assembly is positioned within the thin-film deposition chamber to assist in thin-film deposition processes. A magnetic sensor apparatus is positioned adjacent to the magnetron assembly. The magnetic sensor apparatus includes a plurality of magne...