ALEXANDRIA, Va., July 16 -- United States Patent no. 12,362,218, issued on July 15, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).
"Substrate holder and methods of use" was invented by Yu-Chi Tsai (Hsinchu, Taiwan) and Chueh-Chi Kuo (Hsinchu, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "An electrostatic substrate holder for use in an extreme ultraviolet radiation lithography system includes a substrate receiving surface having a plurality of gas passages in fluid communication with a variable gas pressure pump. Varying the pressure in a void space between the backside of the substrate and the substrate receiving surface of the substrate holder promotes removal of non-...