US Patent Issued to Taiwan Semiconductor Manufacturing on July 15 for "Spacer structure for semiconductor device" (Taiwanese Inventors)

ALEXANDRIA, Va., July 16 -- United States Patent no. 12,363,980, issued on July 15, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).

"Spacer structure for semiconductor device" was invented by Chen-Han Wang (Zhubei, Taiwan), Ding-Kang Shih (New Taipei, Taiwan), Chun-Hsiung Lin (Zhubei, Taiwan), Teng-Chun Tsai (Hsinchu, Taiwan), Zhi-Chang Lin (Zhubei, Taiwan), Akira Mineji (Hsinchu, Taiwan) and Yao-Sheng Huang (Kaohsiung, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure describes an inner spacer structure for a semiconductor device and a method for forming the same. The method for forming the inner spacer structure in the semiconductor device can inclu...