ALEXANDRIA, Va., July 16 -- United States Patent no. 12,360,458, issued on July 15, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).
"Radiation collector" was invented by Cheng Hung Tsai (Hsinchu, Taiwan), Sheng-Kang Yu (Hsinchu, Taiwan), Shang-Chieh Chien (Hsinchu, Taiwan), Heng-Hsin Liu (Hsinchu, Taiwan) and Li-Jui Chen (Hsinchu, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "Methods and apparatuses for a lithography exposure process are described. The method includes irradiating a target droplet with a laser beam to create an extreme ultraviolet (EUV) light. The methods utilized and the apparatuses include two or more collectors for collecting the generated EUV light a...