ALEXANDRIA, Va., July 16 -- United States Patent no. 12,360,464, issued on July 15, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).
"Lithography system and method thereof" was invented by Shao-Hua Wang (Taoyuan, Taiwan), Chueh-Chi Kuo (Kaohsiung, Taiwan), Kuei-Lin Ho (Hsinchu County, Taiwan), Zong-You Yang (Hsinchu County, Taiwan), Cheng-Wei Sun (Hsinchu, Taiwan), Wei-Yuan Chen (Hsinchu County, Taiwan), Cheng-Chieh Chen (Tainan, Taiwan), Heng-Hsin Liu (New Taipei, Taiwan) and Li-Jui Chen (Hsinchu, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A lithography system includes a table body, a wafer stage, a first sliding member, a second sliding member, a first cable, a ...