US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on July 15 for "Integrated circuit layouts with source and drain contacts of different widths" (Taiwanese Inventors)

ALEXANDRIA, Va., July 16 -- United States Patent no. 12,363,982, issued on July 15, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).

"Integrated circuit layouts with source and drain contacts of different widths" was invented by Shang-Syuan Ciou (Hsinchu, Taiwan), Hui-Zhong Zhuang (Hsinchu, Taiwan), Jung-Chan Yang (Hsinchu, Taiwan) and Li-Chun Tien (Hsinchu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A system for processing a layout of a semiconductor device includes a processor, and a computer readable storage medium. The processor is configured to execute instructions to generate an active region layout pattern extending in a first direction, generate a pluralit...