ALEXANDRIA, Va., July 16 -- United States Patent no. 12,362,285, issued on July 15, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).
"Alignment structure for semiconductor device and method of forming same" was invented by Chi-Sheng Lai (Hsinchu, Taiwan), Wei-Chung Sun (Hsinchu, Taiwan), Li-Ting Chen (Taichung, Taiwan), Kuei-Yu Kao (Hsinchu, Taiwan) and Chih-Han Lin (Hsinchu, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "An alignment structure for a semiconductor device and a method of forming same are provided. A method includes forming an isolation region over a substrate and forming an alignment structure over the isolation region. Forming the alignment structure incl...