ALEXANDRIA, Va., July 3 -- United States Patent no. 12,347,692, issued on July 1, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).

"Wet bench process with in-situ pre-treatment operation" was invented by Chung-Wei Chang (Hsinchu, Taiwan), Bo-Wei Chou (Hsinchu, Taiwan), Chin-Ming Lin (Hsinchu, Taiwan), Ping-Jung Huang (Douliou, Taiwan), Pi-Chun Yu (Taipei, Taiwan), Bi-Ming Yen (HsinChu, Taiwan) and Peng Shen (Taoyuan, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments of the present disclosure relates to a wet bench processing including an in-situ pre-treatment prior to performing the first set of wet bench operations. The pre-treatment may include a pre-clean ...