US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on July 1 for "Wet bench and chemical treatment method using the same" (Taiwanese Inventor)

ALEXANDRIA, Va., July 3 -- United States Patent no. 12,347,700, issued on July 1, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING Co. LTD. (Hsinchu, Taiwan).

"Wet bench and chemical treatment method using the same" was invented by Hsin-Chen Cheng (Taichung, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method includes introducing a chemical liquid into the inner tank; reacting the wafer with the chemical liquid to generate byproducts; overfilling the inner tank with the chemical liquid and the byproducts from the inner tank to an outer tank, wherein the outer tank has an upper inclined bottom plate, a lower flat bottom plate, and a vertical intermediary bottom plate connecting the upper inclined...