US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on July 1 for "Methods of making a semiconductor device" (Taiwanese Inventors)

ALEXANDRIA, Va., July 3 -- United States Patent no. 12,346,027, issued on July 1, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).

"Methods of making a semiconductor device" was invented by Pei-Cheng Hsu (Hsinchu, Taiwan), Ching-Huang Chen (Hsinchu, Taiwan), Hung-Yi Tsai (Hsinchu, Taiwan), Ming-Wei Chen (Hsinchu, Taiwan), Hsin-Chang Lee (Hsinchu, Taiwan) and Ta-Cheng Lien (Hsinchu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A reflective mask includes a substrate, a reflective multilayer disposed on the substrate, a capping layer disposed on the reflective multilayer, and an absorber layer disposed on the capping layer. The absorber layer includes one or more alter...