ALEXANDRIA, Va., July 3 -- United States Patent no. 12,347,716, issued on July 1, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING Co. LTD. (Hsinchu, Taiwan).
"Method for cleaning electrostatic chuck" was invented by Yueh-Lin Yang (Tainan, Taiwan) and Chi-Hung Liao (New Taipei, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method includes emitting, by a first portion of an optical inspection instrument, a radiation toward a supporting surface of a chuck, wherein the chuck is configured for fixing a semiconductor workpiece on the supporting surface, and the optical inspection instrument faces the supporting surface; receiving, by a second portion of the optical inspection instrument, a reflection ...