US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on July 1 for "Method and system of removing particles from pellicle" (Taiwanese Inventors)

ALEXANDRIA, Va., July 3 -- United States Patent no. 12,346,034, issued on July 1, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).

"Method and system of removing particles from pellicle" was invented by Cheng-Kang Hu (Hsinchu, Taiwan), Yin Yuan Chen (Hsinchu, Taiwan), Ya-Chieh Wen (Hsinchu, Taiwan), Hsu-Shui Liu (Hsinchu, Taiwan) and Jiun-Rong Pai (Hsinchu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of removing a particle from a pellicle includes moving a nozzle over a surface of a membrane of the pellicle to a location of the particle. A droplet of a liquid material is dispensed from the nozzle to cover the particle on the surface of the membrane. A cont...