ALEXANDRIA, Va., Jan. 29 -- United States Patent no. 12,210,200, issued on Jan. 28, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING Co. LTD. (Hsinchu, Taiwan).
"Photonic semiconductor device and method of manufacture" was invented by Chung-Ming Weng (Hsinchu, Taiwan), Chen-Hua Yu (Hsinchu, Taiwan), Chung-Shi Liu (Hsinchu, Taiwan), Hao-Yi Tsai (Hsinchu, Taiwan), Cheng-Chieh Hsieh (Tainan, Taiwan), Hung-Yi Kuo (Taipei, Taiwan), Tsung-Yuan Yu (Taipei, Taiwan), Hua-Kuei Lin (Hsinchu, Taiwan) and Che-Hsiang Hsu (Taichung, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A package includes a photonic layer on a substrate, the photonic layer including a silicon waveguide coupled to a grating coupler; an int...