ALEXANDRIA, Va., Jan. 28 -- United States Patent no. 12,538,567, issued on Jan. 27, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).
"Semiconductor structure" was invented by Chia-Cheng Chen (Hsin-Chu, Taiwan), Chia-Ling Chan (New Taipei, Taiwan), Liang-Yin Chen (Hsinchu, Taiwan) and Huicheng Chang (Tainan, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor structure is provided. The semiconductor structure includes a gate structure over a substrate. The semiconductor structure also includes a gate spacer on a sidewall of the gate structure. The semiconductor structure also includes a source/drain feature adjacent to the gate structure. The semiconductor s...