US Patent Issued to Taiwan Semiconductor Manufacturing on Jan. 20 for "EUV source with rotation crucible and laser and tin (SN) auto-filling method" (Taiwanese Inventors)

ALEXANDRIA, Va., Jan. 20 -- United States Patent no. 12,532,400, issued on Jan. 20, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).

"EUV source with rotation crucible and laser and tin (SN) auto-filling method" was invented by Hsin-Fu Tseng (Hsinchu, Taiwan), Chih-Chiang Tu (Hsinchu, Taiwan), Chih-Wei Wen (Hsinchu, Taiwan) and Chien-Hsing Lu (Hsinchu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A tin (Sn) auto-filling device and system provided to provide new liquid Sn to an inner sidewall surface of a rotation crucible. A laser is exposed to the liquid Sn at the inner sidewall surface of the rotation crucible to generate extreme-ultraviolet-light (EUV) that is utiliz...