US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on Jan. 13 for "Methods for removing catalyst particles from nanotube films" (Taiwanese Inventors)

ALEXANDRIA, Va., Jan. 13 -- United States Patent no. 12,523,929, issued on Jan. 13, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).

"Methods for removing catalyst particles from nanotube films" was invented by Ping-Hsun Lin (New Taipei, Taiwan), Pei-Cheng Hsu (Taipei, Taiwan), Huan-Ling Lee (Hsinchu, Taiwan), Ta-Cheng Lien (Cyonglin, Taiwan), Hsin-Chang Lee (Zhubei, Taiwan) and Chin-Hsiang Lin (Hsin-chu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "Methods for removing a catalyst particle from a nanotube film used in a photolithographic patterning process are disclosed. The catalyst particle is identified based on its size in the nanotube film. This identification ...