ALEXANDRIA, Va., Jan. 13 -- United States Patent no. 12,525,421, issued on Jan. 13, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).

"Ion source head and ion source head curved liner, deflector, or repeller" was invented by Po-Tang Tseng (Hsinchu, Taiwan), Ching-Heng Yen (Hsinchu, Taiwan), Tai-Kun Kao (Hsinchu, Taiwan), Sheng-Tai Peng (Hsinchu, Taiwan) and Chun Yan Chen (Hsinchu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "An ion source head includes a curved liner that is configured to more closely and accurately repel, direct, or deflect ion species generated within an ion source cavity of an ion source container of an ion source head towards an ion beam opening that...