US Patent Issued to Taiwan Semiconductor Manufacturing on Feb. 4 for "Spacer structure for semiconductor device" (Taiwanese, American Inventors)

ALEXANDRIA, Va., Feb. 5 -- United States Patent no. 12,218,219, issued on Feb. 4, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).

"Spacer structure for semiconductor device" was invented by Jung-Hao Chang (Taichung, Taiwan), Fo-Ju Lin (Keelung, Taiwan), Fang-Wei Lee (Hsinchu, Taiwan), Li-Te Lin (Hsinchu, Taiwan) and Pinyen Lin (Rochester, N.Y.).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure describes a semiconductor structure and a method for forming the same. The method can include forming a fin structure over a substrate. The fin structure can include first and second sacrificial layers. The method can further include forming a recess structure in a firs...