ALEXANDRIA, Va., Feb. 5 -- United States Patent no. 12,218,227, issued on Feb. 4, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).
"Semiconductor structure" was invented by Shih-Hao Lin (Hsinchu, Taiwan), Chia-Hung Chou (Hsinchu, Taiwan), Chih-Hsuan Chen (Hsinchu, Taiwan), Ping-En Cheng (Hsinchu, Taiwan), Hsin-Wen Su (Yunlin County, Taiwan), Chien-Chih Lin (Taichung, Taiwan) and Szu-Chi Yang (Hsinchu, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor structure includes substrate, semiconductor layers, source/drain features, metal oxide layers, and a gate structure. The semiconductor layers extend in an X-direction and over the substrate. The semiconductor...