ALEXANDRIA, Va., Feb. 5 -- United States Patent no. 12,217,960, issued on Feb. 4, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING Co. LTD. (Hsinchu, Taiwan).

"Semiconductor devices and methods of manufacture" was invented by Min-Sung Kuo (Hsinchu, Taiwan), I-Kai Hung (Hsinchu, Taiwan), Po-Wei Chen (Hsinchu, Taiwan) and Chung-Cheng Chen (Toufen, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "Semiconductor devices and methods of manufacture are provided whereby fences are formed over a substrate and III-V materials are grown over the substrate, wherein the fences block growth of the III-V materials. As such, smaller areas of the III-V materials are grown, thereby preventing stresses that occur with t...