US Patent Issued to Taiwan Semiconductor Manufacturing on Feb. 3 for "System and method to reduce layout dimensions using non-perpendicular process scheme" (Taiwanese Inventors)

ALEXANDRIA, Va., Feb. 3 -- United States Patent no. 12,543,557, issued on Feb. 3, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).

"System and method to reduce layout dimensions using non-perpendicular process scheme" was invented by Yu-Tien Shen (Hsinchu, Taiwan), Ken-Hsien Hsieh (Hsinchu, Taiwan) and Shih-Ming Chang (Hsinchu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor processing system includes a layout database that stores a plurality of layouts indicating features to be formed in a wafer. The semiconductor processing system includes a layout analyzer that analyzes the layouts and determines, for each layout, whether a non-perpendicular particle bom...